基于单片机技术的瓦斯抽采浓度自动调节阀研究

doi:10.11799/ce201503044

煤炭工程 ›› 2015, Vol. 47 ›› Issue (3): 135-137.doi: 10.11799/ce201503044

基于单片机技术的瓦斯抽采浓度自动调节阀研究

王振锋¹,周英²,孙玉宁¹,王永龙¹

1. 河南理工大学
2. 河南理工大学能源科学与工程学院

收稿日期:2014-03-09 修回日期:2013-12-31 出版日期:2015-03-10 发布日期:2015-03-25
通讯作者: 王振锋 E-mail:wf360@126.com

Study on automatic control valve for gas concentration based on Microcontroller technolog

Received:2014-03-09 Revised:2013-12-31 Online:2015-03-10 Published:2015-03-25

摘要/Abstract

摘要： 基于瓦斯抽采钻孔浓度和负压之间的关系，针对瓦斯抽采过程中存在的浓度过低导致的管路安全隐患及瓦斯排空等问题，设计了一种单片机控制的瓦斯浓度控制阀体，其能自动调节钻孔抽采口通径大小，进而调节抽采瓦斯浓度，实验室研究表明，在同等瓦斯流量供应情况下，经浓度调节阀调节之后，孔口浓度均有大幅度的提高，在基础浓度为70%情况下最高浓度提高至98.1%提高比例达40.1%，在基础浓度为5%的情况下最高浓度提高至32.9%，提高比例达558%，另外，最终浓度随着基础浓度的降低而降低，而浓度提高比例则随着基础浓度的降低而大幅度提高。

关键词: 瓦斯浓度自动控制, 单片机技术, 负压调节, 浓度调节, 控制阀

Abstract: Based on the relationship between the concentration and the negative pressure of gas drainage drilling, aiming to the phenomenon of gas emptying and safety hazards because of the low concentration in the gas extraction process, designed a gas concentration adjust valve controlled by the microcontroller that can automatically regulating the gas extraction concentration by adjusting the drainage mouth diameter size of the drilling, Study result show that in the same gas flow supply case, the concentration of the drilling has greatly improved after adjusting by control value , in the basis of the concentration of 70%, the highest concentration improves by 98.1%, the proportion improves by 40.1%, in the basis of the concentration of 5%，the highest concentration improves by 32.9%, the proportion improves by 558%, the final concentration is reduce as the base concentration decreases, while the increasing proportion greatly improve as the base concentration decreases.

Key words: gas concentration automatic control, microcontroller technology, negative pressure regulation, concentration adjustment, control valve

中图分类号:

TD821

王振锋，周英，孙玉宁，王永龙. 基于单片机技术的瓦斯抽采浓度自动调节阀研究[J]. 煤炭工程, 2015, 47(3): 135-137.

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基于单片机技术的瓦斯抽采浓度自动调节阀研究

Study on automatic control valve for gas concentration based on Microcontroller technolog

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